earticle

영어

In this study, a Proton-Transfer Reaction-Time-of-Flight Mass spectrometer (PTR-TOF-MS) was used for the continuous monitoring of Volatile Organic Compounds (VOCs) emitted from semiconductor workplace such as photolithography (PHOTO), flat panel display (FPD), organic light emitting diode (OLED), etching (WET) process. The averaged VOCs mixing ratio in the such workplace, PHOTO was 6.5 ppm, FPH was 6.4 ppm, WET was 2.0 ppm and OLED was 1.3 ppm, respectively. The abundance of VOCs in the workplace were methyl ethyl ketone (MEK) with 2.8 ppm (69%) and acetaldehyde with 0.5 ppm (13.2%). Depending on the semiconductor process characteristics, various VOCs have been observed in the workplace. The VOCs mixing ratio are lower than the workplace regulation standard (TWA), it is necessary to continuously monitor and effectively manage these VOCs.

한국어

본 연구에서는 양자전이 비행시간질량분석기(PTR-ToF-MS)를 이용하여 반도체 공정의 작업환경(PHOTO, FPD, OLED, WET 공정)에서 VOCs를 실시간으로 모니터링하였다. 작업환경에서 평균 VOCs 농도는 PHOTO 6.5 ppm, FPH 6.4 ppm, WET 2.0 ppm, OLED 1.3 ppm이었다. VOCs 중 methyl ethyl ketone이 2.8 ppm (69%), acetaldehyde가 0.5 ppm (13.2%)로 나타났다. 반도체 공정 특성에 따라 다양한 VOCs 가 작업환경에서 관측되었다. 관측된 VOCs 농도는 작업환 경기준보다 낮지만, 이러한 VOCs를 지속적으로 모니터링하여 효과적으로 관리해 나갈 필요가 있다.