원문정보
초록
영어
Nanoimprint lithography (NIL) is one of the most promising technologies to fabricate nanopattern on solid substrate because of its several advantages such as resolution, reliability, and process speed, compared to conventional lithography. By using NIL, nano-scale to micro-scale nanostructures was fabricated on large scale silicon on insulator (SOI) plate at mild condition. The fabricated nanowire patterns were characterized by FE-SEM. An antibody was immobilized on the fabricated nanowire pattern, which has affinity for target molecule of interest. And then target molecules were detected by analyzing the change of nanowire conductance using semiconductor parameter analyzer. In this study, the proposed NIL technique can be useful as a method for the fabrication of nanoscale biosensor.
Acknowledgments: This research was supported by the Core Environmental Technology Development Project for Next Generation funded by the Ministry of Environment of Korea, and by Nuclear R&D program through the Korea Science and Engineering Foundation (KOSEF) funded by the Ministry of Education, Science and Technology (MEST) of Korea (Grant No. M20706010003-08M0601-00310)