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UV 나노 임프린트 리소그래피를 이용한 유무기 하이브리드 박막 위 액정 배향용 패턴 구조체 생성

원문정보

Fabrication of Pattern Structures on a Organic-inorganic Hybrid thin Film Via UV Nanoimprint Lithography for Liquid Crystal Alignment

이주환

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초록

영어

Using UV nanoimprint lithography(UV-NIL), 1-dimensional(1-D) pattern structures were fabricated on a hybrid mixture thin film of lanthanum oxide and a UV-curable resin. 1-D pattern on a wafer fabricated by the laser interference lithography was transferred to polydimethylsiloxane and this is used as a mold of UV-NIL process. Conducting an X-ray photoelectron spectroscopy, C 1s and La 3d spectra were analyzed, and it was confirmed that hybrid thin film was successfully deposited on glass substrate. Also, transferred pattern structure was observed by using an atomic force microscopy. Through this, it was revealed that agglomerations between 1-D pattern were increased as UV irradiation time increased and this phenomenon disrupted the quality of NIL process. Additionally, liquid crystal(LC) cells with patterned hybrid thin films were fabricated and LC alignment performances were investigated. Using the polarizing optical microscopy and the crystal rotation method, LC alignment state and pretilt angles were observed. Consequently, the uniform homogeneous LC alignment was achieved at UV irradiation time of 1min and 3min where high resolution pattern transfer was observed.

목차

ABSTRACT
1. 서론
2. 실험
3. 결과 및 고찰
4. 결론
References

저자정보

  • 이주환 Ju Hwan Lee. Member, Department of Electrical and Electronic Engineering, Yonsei University

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