earticle

영어

Niobium nitride (NbN) superconducting thin films with the thickness of 100 and 400 nm have been deposited on the surfaces of silicon oxide/silicon substrates using a sputtering method. Their superconducting properties have been evaluated in terms of the transition temperature, critical magnetic field, and critical current density. In addition, the NbN films were patterned in a line with a width of 10 μm by a reactive ion etching (RIE) process for their characterization. This study proves the applicability of the standard complementary metal–oxide–semiconductor (CMOS) process in the fabrication of superconducting thin films without considerable degradation of superconducting properties.