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Technical Paper

Influence of the Thin-Film Ag Electrode Deposition Thickness on the Current Characteristics of a CVD Diamond Radiation Detector

원문정보

Chae-Min Ban, Chul-Yong Lee, Byung-Hyuk Jun

피인용수 : 0(자료제공 : 네이버학술정보)

초록

영어

Background: We investigated the current characteristics of a thin-film Ag electrode on a chemical vapor deposition (CVD) diamond. The CVD diamond is widely recognized as a radiation detection material because of its high tolerance against high radiation, stable response to various dose rates, and good sensitivity. Additionally, thin-film Ag has been widely used as an electrode with high electrical conductivity. Materials and Methods: Considering these properties, the thin-film Ag electrode was deposited onto CVD diamonds with varied deposition thicknesses (≒50/98/152/257 nm); subsequently, the surface thickness, surface roughness, leakage current, and photo-current were characterized. Results and Discussion: The leakage current was found to be very low, and the photo-current output signal was observed as stable for a deposited film thickness of 98 nm; at this thickness, a uniform and constant surface roughness of the deposited thin-film Ag electrode were obtained. Conclusion: We found that a CVD diamond radiation detector with a thin-film Ag electrode deposition thickness close to 100 nm exhibited minimal leakage current and yielded a highly stable output signal.

목차

ABSTRACT
Introduction
Materials and Methods
Results and Discussion
Conclusion
Acknowledgments
References

저자정보

  • Chae-Min Ban Neutron Utilization Research Division, Korea Atomic Energy Research Institute, Daejeon, Korea
  • Chul-Yong Lee Neutron Utilization Research Division, Korea Atomic Energy Research Institute, Daejeon, Korea
  • Byung-Hyuk Jun Neutron Utilization Research Division, Korea Atomic Energy Research Institute, Daejeon, Korea

참고문헌

자료제공 : 네이버학술정보

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