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Fabrication of ZnSn Thin Films Obtained by RF co-sputtering

초록

영어

The Zn, Sn, and ZnSn thin films were deposited on Si(100) substrate using radio frequency (RF) magnetron cosputtering method. A surface profiler and X-ray photoelectron spectroscopy (XPS) were used to investigate the Zn, Sn, and ZnSn thin films. Thickness of the thin films was measured by a surface profiler. The deposition rates of pure Zn and Sn thin films were calculated with thickness and sputtering time for optimization. From the survey XPS spectra, we could conclude that the thin films were successfully deposited on Si(100) substrate. The chemical environment of the Zn and Sn was monitored with high resolution XPS spectra in the binding energy regions of Zn 2p, Sn 3d, O 1s, and C 1s.

목차

Abstract
 1. Introduction
 2. Experimental Section
 3. Results and Discussion
 4. Conclusion
 References

저자정보

  • Seokhee Lee Department of Chemistry, Pukyong National University
  • Juyun Park Department of Chemistry, Pukyong National University
  • Yujin Kang Department of Chemistry, Pukyong National University
  • Ahrom Choi Department of Chemistry, Pukyong National University
  • Jinhee Choi Department of Chemistry, Pukyong National University
  • Yong-Cheol Kang Department of Chemistry, Pukyong National University

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