원문정보
Synthesis and Photosensitive Properties of Poly[N-(formyloxy phenyI)maleimide] Containing Photosensitive Groups
초록
영어
Synthesis of poly[N-(formyloxyphenyl)maleimide](PFOMI) as photopolymer were investigated with various kinds of photosensitive groups. Generally, photopolyimide have some deficiencies in solubility, sensitivity, reserve stability of the photosensitive solution, and the precision of image pattern. The study has been required on those polymers which have high glass transition temperature and photo efficiency, and low dielectricity. The existing condensation resins require high curing temperature and perfect elimination of subreacted materials that are produced during the process after irradiation and various membrane damages such as the deformation and contraction in image pattern cure. In this study poly[N-(hydroxyphenyl)maleimide](PHPMI) was synthesized. The PHPMI were analyzed by H-NMR and FT-IR. The measured number average molecular weight of PHPMI was produced was 1.06 ×104. Poly[N-(formyloxyphenyl)maleimide](PFOMI) as a type of photo-Fries rearrangement was synthesized by NHPMI and formic acid followed by radical polymerization. PFOMI was analyzed by FT-IR, and photocharacteristics was investgated by UV spectra and FT-IR before and after UV irradiation. Based on the image characteristics of PFOMI measured from optical micrographs, it was formed that the resolution of positive type PFOMI was 0.5 um.
목차
서론
실험
N-(hydroxyphenyl) maleimide(NHPMI)의 합성
Photo-Fries 전위형 polyimide(PFOMI)의 합성
결과 및 고찰
NHPMI의 특성
PFOMI polymaleimide의 특성
PFOMI의 감광특성
결론
참고문헌