원문정보
The Development of Uniform Distribution Surface Measurement System in Three Axis Full Automatic Wafer and LCD(The First)
초록
영어
This study is a development of a system for measuring the surface resistance of wafer and LCD by utilizing a three-axis positioner. Previous wafer measuring system is a developed product for measuring a wafer surface resistance. This is developed very long time. This is not a real action that it is needed a persistence development.. So, that is effected as weak point by simple mechanism and old software. This product is forecasted not being risen in world market. Therefore, this new product(surface measuring system by three axis positioner type) through this research is off the point a previous one axis revolute type, this new product is forecasted capable of a measurement not only wafer but also LCD.
목차
1. 서론
2. 표면측정 System 개발 현황
3. 연구 목표
4. 표면측정 System 개발 내용 및 방법
5. 개발 시 기대 및 예상효과
6. 개발 목표
후기
References