원문정보
The growth of in-situ MgBz thin film by ESSD method
피인용수 : 0건 (자료제공 : 네이버학술정보)
초록
영어
We obtained in-situ MgBz thin films in an one-step process using ESSD (Evaporation Sputtering Simultaneous Deposition) method. In our approach, the Ma evaporator is designed specially. Mg and B are simultaneously evaporated and sputtered, respectively, in the specially designed ESSD chamber. The background pressure was less than 1 x 10-6 Torr. The substrate temperature was kept at 623 K. The film properties were investigated by both electrical resistivity and PPMS. As a result, typical Tc of films was 11 K.
목차
Abstract
1. 서론
2. 실험방법
2.1 ESSD 장비 소개
2.2 ESSD 장비 구축
3. 실험결과 및 논의
3.1 ESSD 방법으로 MgB2 박막제조
3.2 MgB2 박막 특성분석 결과 및 논의
4. 결론
참고문헌
저자소개
1. 서론
2. 실험방법
2.1 ESSD 장비 소개
2.2 ESSD 장비 구축
3. 실험결과 및 논의
3.1 ESSD 방법으로 MgB2 박막제조
3.2 MgB2 박막 특성분석 결과 및 논의
4. 결론
참고문헌
저자소개
저자정보
참고문헌
자료제공 : 네이버학술정보
