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논문검색

Fabrication and Characterization of Free-Standing DBR Porous Silicon Film

초록

영어

Distributed Bragg reflector porous silicon of different characteristics were formed to determine their optical constants in the visible wavelength range using a periodic square wave current between low and high current densities. The surface and cross-sectional SEM images of distributed Bragg reflector porous silicon were obtained using a cold field emission scanning electron microscope. The surface image of distributed Bragg reflector porous silicon indicates that the distributions of pores are even. The cross-sectional image illustrates that the multilayer of distributed Bragg reflector porous silicon exhibits a depth of few microns and applying of square current density during the etching process results two distinct refractive indices in the contrast. Distributed Bragg reflector porous silicon exhibited a porosity depth profile that related directly to the current-time profile used in etch. Its free-standing film was obtained by applying an electropolishing current.

목차

Abstract
 1. Introduction
 2. Experimental Section
  2.1. Preparation of DBR PSi
  2.2. Instruments and Data Acquisitions
 3. Results and Discussion
 4. Conclusion
 Acknowledgment
 References

저자정보

  • Sungyong Um Department of Chemistry, Chosun University
  • Honglae Sohn Department of Chemistry, Chosun University

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