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Silicon nanowires were detached and obtained from silicon nanowire arrays on silicon substrate using a ultrasonomethod. Silicon nanowire arrays on silicon substrate were prepared with an electroless metal assisted etching of p -type silicon. The etching solution was an aqueous HF solution containing silver nitrate. SEM observation shows that wellaligned nanowire arrays perpendicular to the surface of the silicon substrate were produced. After sonication of silicon nanowire array, an individual silicon nanowire was confirmed by FESEM. Optical characteristics of SiNWs were measured by FT-IR spectroscopy. The surface of SiNWs are terminated with hydrogen.