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포토마스크가 필요 없는 스크린 제판 기술 개발(Ш)

원문정보

A Development on the Non-Photomask Plate Making Technology for Screen Printing(Ш)

강효진, 박경진, 김성빈, 남수용, 안병현

피인용수 : 0(자료제공 : 네이버학술정보)

초록

영어

We designed a UV-LED exposure system which has 365nm dominant wavelength due to the environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with UV-LED light source. Then it was developed by air spray with 1.7 kgf/㎠ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making. was 100㎛, so we could establish the possibility of environment-friendly maskless screen plate making technology. But the sharpness of the patterns were ±40㎛ since the exposure system for maskless plate making has weak light intensity and the diffusion of light.

목차

Abstract
 1. 서론
 2. 실험
  2-1. Maskless용 스크린 제판 공정
  2-2. Maskless용 노광 및 건식 현상 시스템
 3. 결과 및 고찰
  3-1. Photoresist 도막의 물성 측정 결과
  3-2. Maskless 스크린 제판의 패턴 형상 및 접착력
  3-3. Maskless 방법으로 제판된 판을 이용한 인쇄물의 패턴 형상 결과
 4. 결론
 참고문헌

저자정보

  • 강효진 Hyo-Jin Kang. 부경대학교 인쇄공학과
  • 박경진 Kyoung-Jin Park. 부경대학교 인쇄공학과
  • 김성빈 Sung-Bin Kim. 부경대학교
  • 남수용 Su-Yong Nam. 부경대학교
  • 안병현 Byung-Hyun Ahn. 부경대학교

참고문헌

자료제공 : 네이버학술정보

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