원문정보
초록
영어
We have manufactured a photoresist which has excellent dispersity and good applying property due to 330cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with CRT light source. Then it was developed by air spray with 1.7kgf/㎠ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were worse than those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making was 0.5 ㎜ since the exposure system for maskless plate making has weak light intensity and the diffusion of light. But we could obtain maskless screen plate which has sharp edges of line image and confirm a possibility of dry development process by air spray method.
목차
1. 서론
2. 실험
2-1. Maskless용 스크린 제판 공정
2-2. Maskless용 photoresist 제조
2-3. Maskless용 노광 및 건식 현상 시스템
2-4. 측정
3. 결과 및 고찰
3-1. Maskless용 photoresist의 분산특성 및 점도 거동
3-2. Maskless용 photoresist 경화막의 물성
3-3. Maskless 스크린 제판의 패턴 형상 및 인쇄 결과
4. 결론
참고문헌